Rakesh K. Kaneriya

Scientist
Space Applications Centre, ISRO


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Area of Expertise: Thin Film Deposition & Characterization, Nanostructure Thin Film, Plasmonics & Photonics, Microelectronics & Nanoelectronics, Multilayer Thin Film, Semiconductor
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Summary
AREA OF INTEREST:
Thin Film Deposition & Characterization, Sputtering, Evaporation, CVD & PECVD, Optical Coating, Ion Assisted Deposition (IAD, IBAE), Multilayer Thin Film, Thin Film Nanostructure, Metallization, Polymer Thin Film, Thin Film Integration, Microelectronics & Nanofabrication, Plasmonics, Scanning Probe Microscopy.


PROFESSIONAL EXPERIENCE:
Scientist, Since Feb 2010
Thin Film & Substrate Processing Division,
Microelectronics Group, Space Application Centre, ISRO, Department of Space, Government of India
• Responsible for development of new thin film material & deposition processes to fabricate the Microwave Integrated Circuit for satellite based space application
• Responsible for characterization & space qualification of new thin film materials for satellite based space application

Senior Officer, Nov 2007- Feb 2010
Thin Film Division
Astro Optics Pvt Ltd, Umergaon, Gujarat, India
• Responsible for design & development of new optical coatings and processes for space and military applications.
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