Chua, Gek-Soon

Dr. Gek-Soon Chua

Member of Technical Staff



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Area of Expertise: OPC/RET, mask specification, source mask optimisation, reticle haze management, mask data preparation, mask process correction
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Summary
Professional experiences include
1. Experience in Optical Proximity Correction (OPC), Resolution Enhancement Technologies (RET) & Advanced Mask Optimization (EUV Mask Process Correction, E-beam mask shot count reduction, Model-based Mask Data Preparation, Source-Mask Optimization (SMO) & Flexible-Mask Optimization (FMO))
2. Driving solution to optimize interactive factors such as OPC, fracturing method, enabling VSB with MPC & mask shot count optimization at same time
3. Lead cross functional teams for mask-related device yield loss issue, mask specification ownership, evaluation for OPC- and mask-related equipments & software
4. Environment expert on cross-Fab clean room environmental studies

Accolades include
1. Invited speaker at ebeam Initiative at PMJ 2012 for “Proof Point on MB-MDP and Wafer Quality Simulation”
2. Invited speaker at EMLC 2012 for “Optimization of mask shot count using MB-MDP and lithography simulation”
3. Invited speaker at ebeam Initiative at BACUS 2011 for “Optimization of mask shot count using MB-MDP and lithography simulation”
4. Awarded BACUS 2011 Best Poster Award (1st Place) for “Optimization of mask shot count using MB-MDP and lithography simulation”
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