Engineer in Physics, Electronics and Materials, then PhD in Nanotechnologies, I have a significant background in optics and metrology. Currently working for the European Synchrotron (ESRF) in the X-Ray Optics Group, I am involved in the characterization of multilayer mirrors (thickness and roughness measurements).
Previously, I have been working as a PhD student and a junior engineer at STMicroelectronics for 3 years. I was in charge of the optimization of the scatterometry technique for advanced CMOS node lithography, and more precisely for double patterning lithography. I implemented a specific methodology to gain in sensitivity and accuracy in critical dimension and overlay measurements. I developed a Matlab code to simulate the sensitivity of diffraction-based overlay and scatterometry targets. I have confronted simulation results to experimental data acquired on wafers in clean room environment.
I am interested in acting in ambitious projects combining physics and engineering. Project management would be an extra motivation.