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Dr. Bruce Smith

Dr. Bruce Smith

Rochester Institute of Technology
Fellow Member
No contact information provided

SPIE Involvement: Awards Committee | Fellow status | Symposium Chair | Conference Chair | Conference Co-chair | Conference Program Committee | Instructor | Author
Publications   Most recent | Show all (116)
Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology (Journal Paper)
Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology  (Journal Paper)
Authors: Zachary Levinson, Erik Verduijn, Obert Wood, et al.
Published: 01 Apr 2016
Image-based pupil plane characterization via principal component analysis for EUVL tools (Conference Proceedings)
Image-based pupil plane characterization via principal component analysis for EUVL tools  (Conference Proceedings)
Authors: Zac Levinson, Andrew Burbine, Erik Verduijn, et al.
Published: 18 Mar 2016
3D mask effects of absorber geometry in EUV lithography systems (Conference Proceedings)
3D mask effects of absorber geometry in EUV lithography systems  (Conference Proceedings)
Authors: Riaz Haque, Zac Levinson, Bruce Smith
Published: 18 Mar 2016
An automated image-based tool for pupil plane characterization of EUVL tools (Conference Proceedings)
An automated image-based tool for pupil plane characterization of EUVL tools  (Conference Proceedings)
Authors: Zac Levinson, Jack Smith, Germain Fenger, et al.
Published: 18 Mar 2016
Bayesian inference for OPC modeling (Conference Proceedings)
Bayesian inference for OPC modeling  (Conference Proceedings)
Authors: Andrew Burbine, John Sturtevant, David Fryer, et al.
Published: 15 Mar 2016
Conference Committee Involvement   Most recent | Show all (19)
SPIE Advanced Lithography  
26 February 2017
San Jose, California, USA
Optical Microlithography XXX  
26 February 2017
San Jose, California, USA
SPIE Advanced Lithography  
21 February 2016
San Jose, California, USA
Optical Microlithography XXIX  
21 February 2016
San Jose, California, USA
SPIE Advanced Lithography  
22 February 2015
San Jose, California, USA
Course Instructor  
SC124: Pushing the Limits: Hyper-NA, Immersion, Polarization, and Pitch Division (Double Patterning) in Optical Lithography
This stand-alone course covers the extension of optical microlithography concepts that can follow the "The Fundamental Limits of Optical Lithography" course, ...

Level: Advanced
Available In-Company
SC117: The Fundamental Limits of Optical Lithography
This course covers the capabilities and challenges in optical lithography using practical approaches to understand basic scientific and engineering principles. ...

Level: Intermediate
Available In-Company

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