• Photomask Technology 2014
    Invitation
    Conference
    Exhibition
    Sponsors
    For Authors/Presenters
    For Chairs/Committees
    For Exhibitors
Monterey Conference Center and Monterey Marriott
Monterey, California, United States
16 - 18 September 2014
Search Open Calls:    go
Print PageEmail Page

SPIE Photomask Technology 2014. The Advance Technical Program will be available in May

SPIE Photomask Technology 2014 in Monterey, California, United States

Attend SPIE Photomask Technology 2014, the premier worldwide technical meeting for the photomask industry. The advance program will be available online in May.

Late abstract submissions will be considered by the chairs.
Questions? email Pat Wight

Presentation topics
Mask Making:
Mask data preparation • Substrates and materials • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask making
9-inch Glass:
Impact of 450mm wafers on reticle and infrastructure • Tool developments to support larger blanks • Material developments
Emerging Mask Technologies:
EUV mask making • EUV mask inspection and repair • EUV mask infrastructure • EUV mask application • Nanoimprint mask making • Nanoimprint mask application • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML²
Mask Business:
Mask manufacturing control • Mask shop management • Mask management in wafer fabs • Business aspects of masks • Infrastructure challenges
Browse the Program Call for Papers PDF >1 MB Sign-in to submit
your abstract
Co-located with SPIE Scanning Microscopy 2014
New in 2014 - SPIE Photomask Technology will be co-located with SPIE Scanning Microscopy 2014, a multidisciplinary conference for advancing scanning microscopy technologies and applications. Two conferences for one registration, plus access to multidisciplinary connections and information.
SPIE Scanning Microscopy
Monterey Conference Center and Monterey Marriott
Monterey, California, United States
16 - 18 September 2014
A look back at the 2013 event 
2013 Technical Program (PDF 1.6 MB)
2013 Technical Abstracts (PDF 1.0 MB)
Keynote Presentation: Delivering Complexity at the Frontier of Electronics, Michael C. Mayberry, Corporate VP of the Technology and Mfg. Group, Director of Components Research, Intel Corp.
Special Session Panel Discussion: Big Glass: Will 9-inch Glass Return? Moderator: Paul W. Ackmann, GLOBALFOUNDRIES Inc.
Networking events: Daily lunches, Exhibition/Poster Reception, Annual Photomask Reception
Exhibition: 10 - 11 September. Meet key suppliers of components, software, and manufacturing equipment in the mask industry
New for 2013 | Conference registration included onsite access to all available proceedings papers. See details


Accepted Papers

If accepted, your research will be published in the SPIE Digital Library

Become part of the world's largest collection
of optics and photonics research papers.

Present at SPIE Photomask Technology
Dynamic | Diverse | Current | Collaborative

Publish in SPIE Proceedings
Timely | Relevant | Cited | Indexed

We welcome your participation.


Sponsors

SPIE logo

Important Dates

Abstract Due Date
24 March 2014

Due Date Extended to
14 April 2014

Author Notifications
12 May 2014

Manuscripts Due
18 August 2014