• Photomask Technology 2015
    For Exhibitors
Monterey Conference Center and Monterey Marriott
Monterey, California, United States
29 September - 1 October 2015
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SPIE Photomask Technology 2015

SPIE Photomask & Scanning Microscopies Final Program PDF

SPIE Photomask Technology 2015, the premier worldwide technical meeting for the photomask industry.

Registration pricing and details View registration pricing and details
A look back at the 2014 Program
Final Technical Program (3 MB PDF)
Technical Abstracts (300 KB PDF) Photomask only

2014 Keynote Presentation

 Martin van den Brink, President and CTO, ASML

Many ways to shrink: The right moves to 10 nanometer and beyond
Martin van den Brink,
President and CTO, ASML

With mobile devices such as smartphones outpacing other market segments, the demand for low-power chips, enabled by continued device shrink, continues to be strong. The semiconductor industry’s drive to innovate is relentless, R&D pipelines are filled, and IC manufacturers have multiple options to continue scaling. This presentation will examine the different technology options for the 10 nanometer node and beyond.

More than 70 presentations in 2014
Mask Making:
Mask data preparation • Substrates and materials • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask making
9-inch Glass:
Impact of 450mm wafers on reticle and infrastructure • Tool developments to support larger blanks • Material developments
Emerging Mask Technologies:
EUV mask making • EUV mask inspection and repair • EUV mask infrastructure • EUV mask application • Nanoimprint mask making • Nanoimprint mask application • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML²
Mask Business:
Mask manufacturing control • Mask shop management • Mask management in wafer fabs • Business aspects of masks • Infrastructure challenges
Browse the Program
Co-located with SPIE Scanning Microscopies 2015
SPIE Photomask Technology is co-located with SPIE Scanning Microscopies 2015, a multidisciplinary conference for advancing scanning microscopy technologies and applications. Two conferences for one registration, plus access to multidisciplinary connections and information.
SPIE Scanning Microscopies
Monterey Conference Center and Monterey Marriott
Monterey, California, United States
29 September - 1 October 2015


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Important Author Dates

Abstract Due Date
13 April 2015

Author Notification
25 May 2015

Manuscripts Due
31 August 2015

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