SPIE Photomask Technology | Annual BACUS Symposium

Present your work at Photomask 2013, the largest international event for the mask industry. This is your chance to share and exchange ideas, be published, and connect with others in the field. Submit your abstract today.

Download the Call for Papers (PDF)

Review conference details and submit your abstract

Suggested topics:

Mask Making

•	Mask data preparation
•	Substrates and materials
•	Patterning tools and processes
•	Resist and resist processing
•	Etch techniques
•	Metrology
•	Inspection
•	Repair
•	Cleaning, contamination, and haze
•	Simulation of mask making

9-inch Glass

•	Impact of 450mm wafers on reticle and infrastructure
•	Tool developments to support larger blanks
•	Material developments

Emerging Mask Technologies

•	EUV mask making
•	EUV mask inspection and repair
•	EUV mask infrastructure
•	EUV mask application
•	Nanoimprint mask making
•	Nanoimprint mask application
•	Pixelated masks
•	Alternative mask technologies
•	Grey-scale masks
•	Direct-write, ML²

Mask Application

•	Double- and multi-patterning
•	Resolution enhancement techniques and OPC
•	Source/mask optimization
•	Design for manufacturability
•	Patterned media
•	Simulation and modeling
•	Inverse lithography technology

Mask Business

•	Mask manufacturing control
•	Mask shop management
•	Mask management in wafer fabs
•	Business aspects of masks
•	Infrastructure challenges

Submit an abstract

The Photomask Technology Exhibition
Don't miss this highly regarded exhibition for buyers and key suppliers of components, software, and manufacturing equipment for the mask industry.
Learn more on the Exhibition website

Become part of the world's largest collection
of optics and photonics research papers.

Present at SPIE Photomask Technology
Dynamic | Diverse | Current | Collaborative

Publish in SPIE Proceedings
Timely | Relevant | Cited | Indexed

A look back at Photomask Technology 2012
Review news from the event
Final Program (PDF)
Technical Abstracts (PDF)

Keynote presentation
Transforming designs to chips: An end-user's point-of-view on mask making John Y. Chen Vice President of Technology and Foundry Management NVIDIA Corp.

Advance Program will be online in June

Sponsors

Advance Program will be online in June

Sponsors

Search Open Calls