• Photomask Technology 2013
    Invitation
    Conference
    Exhibition
    Sponsors
    Travel to Monterey
    Hotel
    Onsite Services
    Proceedings
    For Authors/Presenters
    For Chairs/Committees
    For Exhibitors
Print PageEmail Page
SPIE Photomask Technology 10 - 12 September 2013
Monterey Conference Center and Monterey Marriott
Monterey, California, United States

Advance Program will be online in June

Monterey, home of Photomask Technology

Present your work at Photomask 2013, the largest international event for the mask industry. This is your chance to share and exchange ideas, be published, and connect with others in the field. Submit your abstract today.

Download the Call for Papers (PDF)

Review conference details and submit your abstract

Suggested topics:

Mask Making

 • Mask data preparation
 • Substrates and materials
 • Patterning tools and processes
 • Resist and resist processing
 • Etch techniques
 • Metrology
 • Inspection
 • Repair
 • Cleaning, contamination, and haze
 • Simulation of mask making

9-inch Glass

 • Impact of 450mm wafers on reticle and infrastructure
 • Tool developments to support larger blanks
 • Material developments

Emerging Mask Technologies

 • EUV mask making
 • EUV mask inspection and repair
 • EUV mask infrastructure
 • EUV mask application
 • Nanoimprint mask making
 • Nanoimprint mask application
 • Pixelated masks
 • Alternative mask technologies
 • Grey-scale masks
 • Direct-write, ML²

Mask Application

 • Double- and multi-patterning
 • Resolution enhancement techniques and OPC
 • Source/mask optimization
 • Design for manufacturability
 • Patterned media
 • Simulation and modeling
 • Inverse lithography technology

Mask Business

 • Mask manufacturing control
 • Mask shop management
 • Mask management in wafer fabs
 • Business aspects of masks
 • Infrastructure challenges

Submit an abstract


The Photomask Technology Exhibition
Don't miss this highly regarded exhibition for buyers and key suppliers of components, software, and manufacturing equipment for the mask industry.
Learn more on the Exhibition website


Become part of the world's largest collection
of optics and photonics research papers.

Present at SPIE Photomask Technology
Dynamic | Diverse | Current | Collaborative

Publish in SPIE Proceedings
Timely | Relevant | Cited | Indexed


A look back at Photomask Technology 2012
Review news from the event
Final Program (PDF)
Technical Abstracts (PDF)
Keynote presentation

Transforming designs to chips: An
end-user's point-of-view on mask making


John Y. Chen
Vice President of Technology and
Foundry Management
NVIDIA Corp.

Sponsors

SPIE logo
Search Open Calls
Enter keywords to find conferences with open calls for papers and submit an abstract.

Important Dates

Abstract Due Date
Late Submissions may be accepted by the conference chairs. Please send them directly to
Pat Wight

 

Author Notifications
10 June 2013

Manuscripts Due
12 August 2013


Browse Photomask 2010 papers


Sign Up for Email Updates
Receive email updates on SPIE Photomask Technology.