SPIE Photomask Technology | The annual BACUS Symposium in Monterey, California

Present your research at the Annual SPIE/BACUS Symposium and have your work be seen by leaders in your field. This worldwide technical conference and exhibition is the premier event for photomask industry.

Papers are being accepted in the topics listed below:

•	View submission guidelines

Mask Infrastructure: • patterning; • resist and resist processing; • etch techniques and processing; • inspection; • cleaning; • repair; • metrology

Mask Integration: • double/triple/quadruple patterning techniques and processes; • design for manufacturing; • process integration and yield optimization; • source/mask optimization (SMO); • hyper-NA applications; • substrate and materials; • extreme NA/immersion applications; • reticle enhancement and optical proximity effects; • mask data preparation and mask rules development; • advanced RET; • DFM opportunities for fabless applications

Emerging Mask Technology: • patterning; • EUV mask materials; • EUV mask infrastructure; • imprint; • gray scale technology and techniques; • mask business and management; • direct-write/maskless technology

Patterned Media: • metrology; • fabrication of masters; • replication; • imaging solutions and techniques; • infrastructure; • photomask applications; • HDD implementation of high-volume manufacturing; • Nano-imprint lithography application; • template/stamp fabrication; • cost-of-ownership analysis

Exhibit at SPIE Photomask in 2010

Download the 2010 Exhibition Contract
Download the 2010 Sponsorship Contract

Now more than ever people are looking for the innovations and solutions that will differentiate their products and research from the rest. Innovation is critical to keeping ahead in difficult economic times and your products are a vital part of the innovation equation. Be sure to get exposure to the Photomask audience by exhibiting.

Submit Your Paper for the Top Event for Photomask Development and Innovation

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