14 - 17 September 2009 Monterey Marriott and Monterey Conference Center Monterey,
California,
USA
Access the research that will keep your work moving forward and your company on the technology roadmap
The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry. This year's symposium will give you the chance hear the latest research on the emerging and on-going issues facing the photomask industry.
Global Collaboration in Semiconductors and Strategies for the Mask Industry
Dr. Michael Polcari President and CEO SEMATECH Inc.
Dr. Michael R. Polcari has served as SEMATECH's president and CEO since 2003. He is responsible for leading the consortium's advanced technology R&D programs in lithography, front end processes, interconnect, and metrology. Dr. Polcari has also overseen the launch of two SEMATECH subsidiaries-ATDF, as a leading R&D processing and prototyping center, and the International SEMATECH Manufacturing Initiative (ISMI), which has added seven members during his tenure.
Exhibit at SPIE Photomask Technology and keep your company on the technology roadmap
Exhibiting at SPIE Photomask Technology is your cost-effective solution for gaining visibilty with your target customers.
Intersted in networking with industry leaders, consulting with your suppliers, and seeing the latest technologies that are changing the way we live and work?
