10 - 12 September 2013 Monterey Conference Center and Monterey Marriott Monterey,
California,
United States
Advance Program will be online in June
Join your peers in in Monterey, California for Photomask Technology, the leading meeting for mask professionals. This is your chance to exchange ideas, hear renowned speakers, and make valuable connections through the many networking and technical events.
2013 Program Overview
Conference dates: 10 - 12 September Exhibition dates: 10 - 11 September
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Advance Technical Program(coming soon) Review online content in the links below. 2013 slideshow
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Keynote Presentation: Delivering Complexity at the Frontier of Electronics, Michael C. Mayberry, Corporate VP of the Technology and Mfg. Group, Director of Components Research, Intel Corp.
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Special Session Panel Discussion: Big Bad Glass: Will 9-inch Glass Return? Moderator: Paul W. Ackmann, GLOBALFOUNDRIES Inc.
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A variety of networking events: Daily lunches, Exhibition/Poster Reception, Annual Photomask Reception
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Exhibition: 10 - 11 September. Meet key suppliers of components, software, and manufacturing equipment in the mask industry
More than 100 presentations in these areas:
Mask Making: Mask data preparation • Substrates and materials • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask making
