Photomask Japan brings together engineers and researchers from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends.

Online registration is now open

Hear presentations on these topics:

• Materials of and for Photomasks
• Fabrication Process Steps and Equipment for Photomasks
• Photomask Writing Tools and Technologies
• Metrology Tools and Technologies
• Inspection Tools and Technologies
• Repairing Tools and Technologies
• Mask Data Preparations
• EDA and DFM for Photomask
• Photomasks with RET: PSM, Masks with OPC
• Photomask related Lithography Technologies
• NGL Masks: EUV, E-Beam, Imprint
• Mask Strategies and Business Challenges: Cost, Cycle-Time etc.

Photomask Japan 2009 website

The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion. Display opportunities will be provided to mask manufacturing materials, and equipment companies.

Sponsors