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SPIE Photomask Technology 28th Annual Symposium 6 - 10 October 2008
Monterey Marriott and Monterey Conference Center
Monterey, California, USA

Exhibition Overview


Tuesday 7 October | 10:00 am to 4:00 pm; 6:00 to 7:30 pm
Wednesday 8 October | 10:00 am to 4:00 pm

Expand your professional network and grow your business at the photomask industry's top exhibition. As the most recognized international meeting for presenting innovations in the mask-making industry, SPIE Photomask Technology is the event for the people, institutions, and companies driving this critical and influential business.

Become an Exhibitor
Access pricing and contracts for the exhibition, sponsorship, and advertising.

Who will be there:

  • Engineers and designers
  • Corporate managers from the mask making industry
  • Application and product developers
  • Mask and chip designers
  • Resist chemists
  • Quality assurance specialists
  • Experts in mask infrastructure and mask integration
  • People working in emerging mask technologies

Extend your presence with a Sponsorship

Already an Exhibitor?
Access information for exhibitors and find what you need to do to make your show a success.

Attend the Exhibition for free!
There is free exhibition access for all exhibitors, registered attendees, and registered visitors.

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