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    Author Submission & Chair Review System


    35th European Mask and Lithography Conference (EMLC 2019)

    Dates: 17-19 June 2019
    Location: Dresden, Germany


    Submissions for EMLC 2019 will go through the SPIE Submission and Review System.

    Submit Your Manuscript

    You will be asked to provide information about your submission, including complete author information.

    An account is required to submit an abstract for this conference. You can create an account when you click on the link below, or if you already have an SPIE account, you can sign in:

    EMLC 2019 

    **Manuscript deadline has been extended to 19 July 2019.

    Manage Your Active Submissions

    Chairs and Committee Members: Access and review submissions.

    Authors: Complete your submission, submit a revision, or view the status of your submission.

    If you have questions about the submission process, please contact Jenny Woods, SPIE Proceedings Coordinator (jennyw@spie.org) or call +1 360 676 3290. SPIE hours are Monday-Friday, 8 am to 5 pm Pacific Time.

    If you have questions about the meeting, please see the meeting website at http://www.atom-n.ro/index.php