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Micro/Nano Lithography

Rick Silver: Developing metrology techniques for the semiconductor industry

NIST collaborates with manufacturers and industry groups to coordinate standards and develop measurement tools.

10 November 2014, SPIE Newsroom. DOI: 10.1117/2.3201411.01

Richard M. Silver is the leader of and a physicist in the Surface & Nanostructure Metrology Group (683.02) in the Semiconductor & Dimensional Metrology Division of the Physical Measurement Laboratory at the National Institute of Standards and Technology (NIST).

Silver is an expert in optical metrology and the emerging field of atom-based dimensional metrology. He has been relied on in numerous forums for his expertise in optical measurements of semiconductor overlay and high-resolution optical critical-dimensional metrology. As leader of the scatterfield optical metrology effort at NIST, he has led the development of a new high-resolution optical technique adopted in several optical platforms. His work helped extend image-based optical microscopy for overlay metrology. He helped develop several Semiconductor Industry Association roadmap metrology components and is a key contributor to the SEMATECH overlay metrology advisory group.

His research has helped advance the understanding of high-resolution optical measurement applications for semiconductor and nanotechnology manufacturing. He holds more than 10 patents focusing on improvements in metrology.

Silver is a Fellow of SPIE, and has served on the program committee of the Metrology, Inspection, and Process Control for Microlithography conference at SPIE Advanced Lithography for 10 years and chaired the conference twice. He has contributed more than 60 papers to SPIE journals and proceedings.