Kurt Ronse: Working on multiple fronts to prepare for next technology node
Kurt Ronse is lithography department director at IMEC (Belgium). He received both MS and PhD degrees in Electrical Engineering from the University of Leuven (Belgium). He joined the lithography group in IMEC in 1990, specializing in the field of phase shifting masks, off-axis illumination techniques and CD control optimization.
He has authored and co-authored numerous publications and is a frequent conference speaker, often times presenting invited and plenary papers, in the field of optical lithography (I-line, deep-UV, 193nm, 193nm immersion) and EUVL.
He has been project leader in several European projects under the Esprit, Jessi, IST, and Medea framework.
At IMEC, Dr. Ronse is responsible for the Advanced Lithography Program covering 193nm immersion, double patterning and EUV lithography. He is a member of SPIE and an associate editor for the SPIE Journal of Micro/Nanolithography, MEMS, and MOEMS.