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Micro/Nano Lithography

Hakaru Mizoguchi: Development of 250W EUV Light Source for HVM Lithography

A plenary talk from SPIE Photonics West 2017.

14 February 2017, SPIE Newsroom. DOI: 10.1117/2.3201702.13

Hakaru Mizoguchi of Gigaphoton Inc. (Japan)In this plenary session, Hakaru Mizoguchi of Gigaphoton Inc. (Japan) discusses the development of the CO2-Sn-LPP EUV light source for HVM EUVL. Mizoguch gives engineering data from a recent test resulting in 118W average clean power, CE=3.7%, with 100kHz operation and other data. They have finished preparation of a CO2 laser with more than 20kW at output power cooperating with Mitsubishi electric cooperation. Further improvements are underway. Mizoguchi also covers the latest data of the Pilot 250W EUV source system.

Hakaru Mizoguchi was appointed Vice President and CTO of Gigaphoton in April 2012. After joining Komatsu in 1982, he was fully involved in development of the CO2 laser. For two years he worked on research of excimer laser technology as a guest researcher at the Max Planck Research Institute in Göttingen, Germany. Then he obtained a doctorate from Kyushu University, and in 1998 was appointed General Manager of Laser Research Department, Research Center, where he played a central role in research on excimer lasers in Japan.

Mizoguchi has been a part of Gigaphoton's management since its founding, serving as General Manager of the Research Division, General Manager of the Development Division, General Manager of Customer Support Division, and Director and CTO. He has promoted research and development of the KrF, ArF, and F2 laser light sources and of EUV light sources for photolithography. He is a member of SPIE, the Laser Society of Japan, and the Japan Society of Applied Physics.