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PI: Motion-Positioning

SPIE Photonics West 2017| Call for Papers

SPIE Photomask Technology 2016 | Ccall for Papers

Journal of Micro/Nanolithography, MEMS, and MOEMS

PI: Motion-Positioning



Micro/Nano Lithography

Large-field-of-view, multi-perspective Talbot microscopy
A novel low-cost scanning microscope enables robust, scalable imaging for microfluidic systems and photonic integrated circuits.
Pattern formation down to 5nm critical dimensions is made possible using an enhanced understanding of the interactions between plasma and block copolymers.
15 April 2016
Nanoimprint technology combined with defect management could significantly reduce the cost of lithography for fabricating semiconductor devices.
7 April 2016
The lithographic capabilities of a photoresist-based material facilitate direct 3D manufacturing of electrically conductive and transparent nanostructures.
4 April 2016
Direct laser interference patterning can be used to fabricate periodic structures directly on polymers, ceramics, metals, and coatings at micrometer and nanometer scales.
29 March 2016
Conventional microprocessing materials and tools are used in a novel high-throughput fabrication technique.
15 March 2016
 
Harry Levinson plenary presentation: Evolution in the Concentration of Activities in Lithography