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SPIE Advanced Lithography 2016|Register Today

Journal of Micro/Nanolithography, MEMS, and MOEMS



Micro/Nano Lithography

Putting the holes in holey white graphene
Catalytic oxidation of boron nitride nanosheets creates pits and holes that have well-defined shapes and edges, enabling ‘holey graphene’ for applications in electronics and molecular transport.
An anamorphic lens with a numerical aperture of about 0.5 can be used to realize economically viable step and scan systems.
12 January 2016
A novel process combines conventional polishing and computer-controlled surface finishing techniques to produce spherical and aspheric surfaces.
7 January 2016
Cold and hot isostatic pressing enables the production of organic semiconductor layers with improved electrical characteristics.
22 December 2015
Considering chip design challenges is critical in accurately quantifying the potential benefit of extreme UV.
16 December 2015
The first demonstration of a random access reconfigurable metamaterial has a flat lens solution and can offer ultimate freedom for wavefront control at sub-wavelength resolutions.
10 December 2015
 
Michael Liehr: Industry and university collaboration is key element in AIM Photonics