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SPIE Photomask Technology 2016 | Register Today

Journal of Micro/Nanolithography, MEMS, and MOEMS

Micro/Nano Lithography

Using specialized mirrors to enable optical scanning in through-focus optical microscopy reduces through-focus instability and scan time.
27 August 2016
A novel, low-cost spacer-on-spacer pitch-splitting approach is targeted at sub-32nm pitch for 7nm technology nodes and beyond.
11 August 2016
A cost-effective, freeform method of manufacturing epidermal electronic systems enables long-term, high-fidelity physiological signal monitoring.
21 July 2016
Interference lithography for mastering and nanoimprint lithography as a microstructure replication technology offer scalability for applications in photovoltaics as well as lighting and displays.
19 July 2016
Silicon fins with a pitch less than 30nm and suitable critical dimensions for advanced field effect transistors are formed by directed self-assembly patterning via chemoepitaxy or self-aligned customization.
8 July 2016
A bilayer system is used in a simplified process to achieve reduced costs compared with standard fabrication methods that are based on organic photoresists.
1 July 2016