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SPIE Advanced Lithography 2018| Call for Papers

SPIE Journals OPEN ACCESS

SPIE PRESS

Micro/Nano Lithography

Nikon celebrates 100 years

SPIE Classics celebrates the 100th anniversary of Nikon.

Alternative fabrication schemes based on concurrent engineering of plasma etching can overcome the limitations inherent in optical lithography and thus help to achieve ever smaller device dimensions.
18 August 2017
The multitrigger resist system is associated with a low cost of ownership and is easily scalable for high-volume manufacturing in future lithography.
14 August 2017
A single photomask is used to align the coordinate systems of two separate metrology tools, to within 25 parts per billion.
9 August 2017
Glassy carbon nanolattices fabricated using 3D direct laser writing and pyrolysis are the smallest 3D printed lattice structures to date.
21 June 2017
A new approach enables the fast simulation of chip-scale imprinting, helping to co-optimize layout designs and processing parameters for acceptable yield and throughput in memory manufacturing.
29 May 2017
 
J. Alexander Liddle: Metrology at the nanoscale key to understanding of next generation lithography processes