Micro/Nano Lithography

Alternative fabrication schemes based on concurrent engineering of plasma etching can overcome the limitations inherent in optical lithography and thus help to achieve ever smaller device dimensions.

The multitrigger resist system is associated with a low cost of ownership and is easily scalable for high-volume manufacturing in future lithography.

A single photomask is used to align the coordinate systems of two separate metrology tools, to within 25 parts per billion.

Glassy carbon nanolattices fabricated using 3D direct laser writing and pyrolysis are the smallest 3D printed lattice structures to date.

A new approach enables the fast simulation of chip-scale imprinting, helping to co-optimize layout designs and processing parameters for acceptable yield and throughput in memory manufacturing.