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Micro/Nano Lithography

Data analytics and machine learning for continued semiconductor scaling
A novel methodology for quantifying design space coverage has great potential for yield optimization of integrated circuits at the 7nm node and beyond.
Advantages such as high resolution and throughput, along with insensitivity to misalignment, make extreme-UV interference lithography a powerful enabling technology for academic and industrial research.
10 October 2016
Using specialized mirrors to enable optical scanning in through-focus optical microscopy reduces through-focus instability and scan time.
27 August 2016
A novel, low-cost spacer-on-spacer pitch-splitting approach is targeted at sub-32nm pitch for 7nm technology nodes and beyond.
11 August 2016
A cost-effective, freeform method of manufacturing epidermal electronic systems enables long-term, high-fidelity physiological signal monitoring.
21 July 2016
Interference lithography for mastering and nanoimprint lithography as a microstructure replication technology offer scalability for applications in photovoltaics as well as lighting and displays.
19 July 2016
Peter Trefonas: Chemistry is key player in lithography process