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SPIE Advanced Lithography 2017| Register Today

OPIE 2017

OPIC 2017

SPIE Journals OPEN ACCESS

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Micro/Nano Lithography

Photonics West_thumb

From the SPIE Photonics West Show Daily: Three plenary speakers at LASE 2017 discussed the LIGO discovery of gravitational waves in space, laser-based direct-write methods, and high-power EUV light sources for lithography.

14 February 2017
Semiconductor nanowires, with lasing emission at room temperature, can be transferred in a controlled way to specific locations on diverse substrates and organized into bespoke spatial patterns.
31 January 2017
Compact, low-threshold III-nitride nanolasers prove to be a versatile platform from which to explore the ultimate properties of lasing in dielectric media thanks to efficient photon funneling.
26 January 2017
An innovative technique is used to pattern ultrahigh-aspect-ratio coplanar electrodes and to enable inexpensive, high-throughput printing of devices on large-area, flexible substrates.
16 January 2017
UV light exposure causes modification of the glass transition temperature in the skin layer of polymeric lenses and enables smoothing without structural changes.
3 January 2017
The use of different fabrication modes for additive and subtractive processes in the novel LithoProf3D platform enables industrial-level scalability for the fabrication of 3D structures.
2 December 2016