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Micro/Nano Lithography

Video: Chris Mack on next-generation lithography and the future of Moore's Law

The "litho guru" talks about engineering challenges facing the various approaches to advancing Moore's Law, and the three requirements for success.
18 April 2012, SPIE Newsroom. DOI: 10.1117/2.3201204.03

Chris A. Mack received Bachelor of Science degrees in physics, chemistry, electrical engineering, and chemical engineering from Rose-Hulman Institute of Technology in 1982, a Master of Science degree in electrical engineering from the University of Maryland in 1989, and a Ph.D. in chemical engineering from the University of Texas at Austin in 1998. He joined the Microelectronics Research Laboratory of the National Security Agency in 1983 and began work in optical lithography research. During 1990-91 he was on assignment at SEMATECH working in the areas of deep-UV photoresist characterization and phase-shifting mask optimization. After founding FINLE Technologies in 1990, in January of 1992 he joined FINLE full time as President and Chief Technical Officer. In February of 2000, FINLE Technologies was acquired by KLA-Tencor. For the next five years he served as Vice President of Lithography Technology for KLA-Tencor. He currently writes, teaches and consults in the field of semiconductor lithography.

Dr. Mack is recognized worldwide as a leading expert in lithography and regularly teaches courses on this subject. In the past twenty years he has trained more than 2,000 lithographers from over 200 different companies around the world, and is an adjunct faculty member in the Electrical and Computer Engineering and Chemical Engineering Departments of the University of Texas at Austin.

He developed the PROLITH ToolkitTM of lithography simulation and analysis programs and has authored over 150 technical publications, three books and several book chapters on lithography. He was interviewed at the SPIE Advanced Lithography symposium in March 2012.