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Micro/Nano Lithography

Edward Charrier: Need to understand pattern roughness leads to computational metrology startup

An interview from SPIE Advanced Lithography 2017.

19 May 2017, SPIE Newsroom. DOI: 10.1117/2.3201705.02

MetroLER is metrology software that analyzes the CD-SEM images of pattern roughness, including LER, LWR, and LCDU. This tool was developed by Fractilia, a new company developing software solutions and services that provide accurate and repeatable analysis of SEM images. This self-funded startup is led by SPIE Fellow Chris Mack and Ed Charrier.

In this interview from SPIE Advanced Lithography 2017, Charrier explains the goals of Fractilia -- to bring rigor, accuracy, and ease-of-use to the analysis of stochastics in semiconductor manufacturing. The team at Fractilia have combined decades of lithography experience with their unique image analysis models and algorithms to create MetroLER.

Ed Charrier has worked in software technologies and data analysis for more than 30 years. As the COO of FINLE Technologies he partnered with Chris Mack to grow the company from a startup through its acquisition and integration by KLA-Tencor.

During his 14 years at KLA, he held several senior positions including Vice President and General Manager of the Process Control Information Division where he had P/L responsibility for 8 enterprise and standalone data analysis and simulation software products which had operations in nine countries.

He received a Bachelor of Science in Engineering degree from University of Michigan and a Master of Business Administration degree from The University of Texas at Austin.

Related content:

Chris Mack: Stochastics and the phenomenon of line-edge roughness