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Micro/Nano Lithography

Brian Grenon: Development paths in photomasks and lithography

With costs driving a more intense focus on solving issues, this industry veteran says source power and mask infrastructure are the key challenges.

17 September 2013, SPIE Newsroom. DOI: 10.1117/2.3201308.03

Brian J. Grenon is business unit manager for the Advanced Technical Instruments (ATI) division of RAVE N.P. in Williston, Vermont. ATI encompasses SEM, AFM, and other analysis tools, as well as custom semiconductor and photomask services such as haze-generation systems. The new division was formed following RAVE's acquisition of certain assets of the Lake Champlain operation of Applied Research Associates in early 2012.

Grenon was president of Grenon Consulting Inc. for 15 years. He is a photomask technologist and manager with more than 30 years experience in all aspects of photomask business and technology, as well as semiconductor manufacturing. Since 1997 his company has provided consulting services to key companies in the photomask infrastructure as well as major semiconductor companies. Key activities in these areas have been centered on improving technical performance, improving business processes and financial performance.

An expert in all areas of photomask technology from photoresist to defect repair, Grenon also spent 20 years with IBM, where he was an advisory scientist responsible for photomask development. He holds six patents in photomask technology and has published more than 200 technical papers.

He is a member of the SPIE/BACUS Steering Committee and a former president of the group. He is a member of the Mask Advisory Steering Committee at International SEMATECH, and Technical Advisor to the University of Quebec (Institute Nationale du Recherche Scientifique) Laboratory for Nano and Micro Technology.

He was interviewed for SPIE Newsroom at the SPIE Advanced Lithography symposium in March, 2013.