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Micro/Nano Lithography

Stephen Bedell: High-performance materials become flexible

By taking advantage of fracturing tendencies that all previous research had sought to prevent, IBM scientists were able to create thin, flexible substrates.

8 December 2014, SPIE Newsroom. DOI: 10.1117/2.3201412.01

Stephen W. Bedell received his BS and PhD in physics from the State University of New York at Albany. He originally served as Manager of Research and Development for Silicon Genesis Corporation in Campbell, CA. He then joined IBM Thomas J. Watson Research Center in 2000 as Research Staff Member and has primarily focused on developing advanced semiconductor substrates and materials for high-performance CMOS applications. His interests include strained-layer physics, crystal defects, ion-solid interactions and advanced semiconductor materials.

Bedell's publications include over 80 articles in various journals, proceedings, and magazines, one book chapter, and over 150 issued or pending patents. He has received the IBM Outstanding Technical Achievement Award and was named IBM Master Inventor in 2012. He has also given numerous invited and plenary talks and co-edited several conference proceedings.