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Micro/Nano Lithography

Charles R. Szmanda Plenary presentation: The New U.S. Patent Law: What You Need to Know and How It Will Affect Your Strategy

Presented at SPIE Advanced Lithography 2013

26 February 2013, SPIE Newsroom. DOI: 10.1117/2.1201302.95

Charles R. Szmanda, The Patent Practice of Szmanda & Shelnut, LLC

In "The New U.S. Patent Law: What You Need to Know and How It Will Affect Your Strategy," Charles Szmanda describes the most important aspects of the new patent law. These include: (1) the "first inventor to file" system, which takes effect on March 16, 2013 and replaces the "first to invent" system in current law; (2) new ways to challenge issued patents such as "Post Grant Review" and "Inter Partes" review; (3) prior art submission during prosecution of another inventor's patent application; (4) prioritized examination of applications; and (5) prior user rights. He also discusses how these new elements of the law will alter the competitive environment but will also present a number of opportunities for formulating a successful patent strategy within that new environment.

Charles R. Szmanda is a principal partner at the Patent Practice of Szmanda & Shelnut, LLC.  During his career, Szamanda designed processes for making silicon devices at Bell Labs, did polymer research for micro and nanolithography, helped found a startup company, Aspect Systems, did fundamental research on electron transfer during molecular collisions, practiced the wonderful art of x-ray crystallography and generally had a lot of fun. He holds 31 U.S. patents and is the author of over 60 scientific publications.