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Micro/Nano Lithography

High-Resolution Patterning: A View of the Future

C. Grant Willson's plenary talk from SPIE Advanced Lithography 2012

29 February 2012, SPIE Newsroom. DOI: 10.1117/2.3201202.19

Grant Willson joined the faculties of the Departments of Chemical Engineering and Chemistry at the University of Texas at Austin in 1993. Prior to that he was an IBM Fellow and Manager of the Polymer Science and Technology area at the IBM Almaden Research Center in San Jose, California.

His research can be characterized as the design and synthesis of functional organic materials with emphasis on materials for microelectronics. These include monomeric and polymeric liquid crystalline materials, polymeric non-linear optical materials, novel photoresist materials, etc.This work is supported by grants from both government and industry.

Among his numerous awards, Willson received the Frits Zernike Award from SPIE in 2005, for outstanding accomplishments in microlithographic technology, especially those furthering the development of semiconductor lithographic imaging solutions. He was the 2007 recipient of the SEMI North America Award. That year he also received the National Medal for Technology and Innovation by the President of the United States, "for creation of novel lithographic imaging materials and techniques that have enabled the manufacturing of smaller, faster and more efficient microelectronic components that better the quality of the lives of people worldwide and improve the competitiveness of the U.S. microelectronics industry."