The SPIE Advanced Lithography 2007 symposium is the largest event focusing on R&D in the semiconductor industry. More than 1000 attendees packed the hall to hear speakers and panelists talk about new developments that will shape the industry in the near future.
Mircea V. Dusa, ASML MaskTools Inc.
Nigel R. Farrar, CYMER, Inc.
In this panel discussion, nine experts discuss the outlook for automated algorithms, engineering analysis and simulation driving next-generation lithography. Panelists include: Andy Neureuther, Univ of California, Berkeley; Alfred Wong, Magma Design Systems; Neal Callan, Brion Technologies, Inc.; Scott Mansfield, IBM Microelectronics Div.; Tatsuhiko Higashiki, Toshiba; Cyrus Tabery, Advanced Micro Devices; Kurt Ronse, IMEC; Steve Renwick, Nikon Precision; and Koichiro Tsujita, Canon.
Video coverage sponsored by CYMER, Inc.