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Micro/Nano Lithography

ArF immersion light source

Cymer

Cymer announces its new argon fluoride (ArF) immersion light source, the XLR 700ix. Built on the industry leading XLR platform, the 700ix provides improvements in bandwidth, wavelength and energy stability, enabling higher scanner throughput and process stability for advanced 14nm chip manufacturing and beyond.

The XLR 700ix provides chipmakers tighter bandwidth control (300+5fm) that essentially eliminates bandwidth as a source of process variation for on-wafer performance. Cymer's patented technology applies high-speed closed loop control on a pulse-by-pulse basis, resulting in extremely stable performance.

The XLR 700ix introduces a reduction in helium consumption by 50 percent, while providing stable performance across all conditions, even at high-duty cycles. Helium is mainly used in the Line Narrowing Module (LNM) as a critical purge gas due to its unique thermal properties to ensure stable optical performance. Additionally, the XLR 700ix reduces power consumption by 15 percent through the inclusion of the latest, field-proven Master Oscillator (MO) chamber design, enabling chipmakers to decrease operating costs.

The XLR 700ix also includes software updates that enhance light source predictability and availability, such as auto chamber conditioning and automated gas optimization, delivering the highest system efficiency to meet demanding manufacturing schedules.

Cymer's XLR 700ix will begin shipping in Q1 2015.

www.cymer.com