SPIE Lithography Asia

SPIE Lithography Asia 2009 is now complete. Please check back in early 2010 for the call for papers for the 2010 meeting.

View 2009 program details:
•	Printable Final Technical Program (PDF)
•	Technical Program online
•	Complete Conference Abstracts (PDF)
•	Authors, chairs, and presenters

Attendees enjoyed the outstanding plenary presentations from these industry leaders:
•	Dr. Burn Lin, Senior Director, TSMC
•	Dr. Kinam Kim, Executive VP and General Manager of R&D, Samsung
•	Dr. Christopher J. Progler, Chief Technology Officer, Photronics, Inc.
•	Dr. Cheng-Wen Wu, Director, ETRI Taiwan

Symposium Chairs:

Alek C. Chen ASML Taiwan Ltd.	Woo-Sung Han Samsung Electronics Co. Ltd.
Burn Lin Taiwan Semiconductor Manufacturing Co. Ltd.	Anthony Yen Taiwan Semiconductor Manufacturing Co. Ltd.

Conference topics include:

Emerging Lithographic Technology and Nanofabrication

	Optical lithography extension (shorter than 157 nm)
	EUV lithography
	E- and ion- beam technology
	Nano-imprint lithography
	Application on nanostructures

Optical Microlithography

	ArF immersion lithography
	RET technology
	Double exposure/double patterning lithography
	OPC modeling
	Photo cluster automation

Advances in Resist Material and Processing

	Emerging resist materials
	Advancement in immersion resists
	Resist process optimizations
	Resist material for LCD application
	Double exposure material

Metrology, Inspection, and Process Control

	Advancement in CD metrology
	Advancement in overlay metrology
	Advancement in defect inspection
	Process control for CD and overlay
	Emerging metrology technology

LCD Application

	Imaging technology
	Process control
	Material technology
	Automation and productivity

SPIE Lithography Asia—Taiwan