SPIE Lithography Asia—Taiwan

Update: To better accommodate the technical needs of the community, we are extending the abstract submission deadline to 30 June 2009.

It is our great pleasure to invite you to participate in the second SPIE Lithography Asia conference, featuring presentations from leading researchers, developers, and innovators, and building on last year’s very successful conference. This is your opportunity to present your research and connect with others working at the leading edge of semiconductor device and flat panel display (FPD) technologies.

Submit your abstract to SPIE Lithography Asia—Taiwan

For companies interested in exhibiting, Download the Exhibitor Contract (PDF).

Don't miss the outstanding plenary presentations from these industry leaders:

Dr. Burn Lin, Senior Director, TSMC
Dr. Kinam Kim, Executive VP and General Manager of R&D, Samsung
Dr. Christopher J. Progler, Chief Technology Officer, Photronics, Inc.
Dr. Cheng-Wen Wu, Director, ETRI Taiwan

Symposium Chairs:

Alek C. Chen ASML Taiwan Ltd.	Woo-Sung Han Samsung Electronics Co. Ltd.
Burn Lin Taiwan Semiconductor Manufacturing Co. Ltd.	Anthony Yen Taiwan Semiconductor Manufacturing Co. Ltd.

Conference topics include:

Emerging Lithographic Technology and Nanofabrication

Optical lithography extension (shorter than 157 nm)

EUV lithography

E- and ion- beam technology

Nano-imprint lithography

Application on nanostructures

Optical Microlithography

ArF immersion lithography

RET technology

Double exposure/double patterning lithography

OPC modeling

Photo cluster automation

Advances in Resist Material and Processing

Emerging resist materials

Advancement in immersion resists

Resist process optimizations

Resist material for LCD application

Double exposure material

Metrology, Inspection, and Process Control

Advancement in CD metrology

Advancement in overlay metrology

Advancement in defect inspection

Process control for CD and overlay

Emerging metrology technology