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SPIE Lithography Asia - Taiwan 18 - 20 November 2009
Sheraton Taipei Hotel
Taipei, Taiwan

SPIE Lithography Asia—Taiwan

SPIE Lithography Asia - Taiwan

Update: To better accommodate the technical needs of the community, we are extending the abstract submission deadline to 30 June 2009.

It is our great pleasure to invite you to participate in the second SPIE Lithography Asia conference, featuring presentations from leading researchers, developers, and innovators, and building on last year’s very successful conference. This is your opportunity to present your research and connect with others working at the leading edge of semiconductor device and flat panel display (FPD) technologies.

Submit your abstract to SPIE Lithography Asia—Taiwan

For companies interested in exhibiting, Download the Exhibitor Contract (PDF).

Don't miss the outstanding plenary presentations from these industry leaders:

  • Dr. Burn Lin, Senior Director, TSMC
  • Dr. Kinam Kim, Executive VP and General Manager of R&D, Samsung
  • Dr. Christopher J. Progler, Chief Technology Officer, Photronics, Inc.
  • Dr. Cheng-Wen Wu, Director, ETRI Taiwan



Symposium Chairs:


Alek C. Chen
ASML Taiwan Ltd.


Woo-Sung Han
Samsung Electronics Co. Ltd.


Burn Lin
Taiwan Semiconductor
Manufacturing Co. Ltd.

Anthony Yen
Taiwan Semiconductor
Manufacturing Co. Ltd.


Conference topics include:

Emerging Lithographic Technology and Nanofabrication
 
  • Optical lithography extension (shorter than 157 nm)
  •  
  • EUV lithography
  •  
  • E- and ion- beam technology
  •  
  • Nano-imprint lithography
  •  
  • Application on nanostructures
  • Optical Microlithography
     
  • ArF immersion lithography
  •  
  • RET technology
  •  
  • Double exposure/double patterning lithography
  •  
  • OPC modeling
  •  
  • Photo cluster automation
  • Advances in Resist Material and Processing
     
  • Emerging resist materials
  •  
  • Advancement in immersion resists
  •  
  • Resist process optimizations
  •  
  • Resist material for LCD application
  •  
  • Double exposure material
  • Metrology, Inspection, and Process Control
     
  • Advancement in CD metrology
  •  
  • Advancement in overlay metrology
  •  
  • Advancement in defect inspection
  •  
  • Process control for CD and overlay
  •  
  • Emerging metrology technology
  • LCD Application
     
  • Imaging technology
  •  
  • Process control
  •  
  • Material technology
  •  
  • Automation and productivity
  • View the PDF version of the printed Call for Papers

    Please plan to join us in Taipei for Lithography Asia 2009!

    Sponsors

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    Cooperating Organizations

    Search Open Calls
    Enter keywords to find conferences with open calls for papers and submit an abstract.

    Important Dates

    Abstract Due Date:
    30 June 2009

    Author Notification Date:
    10 August 2009

    Full-Length Manuscripts Due:
    26 October 2009


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