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Nanoscribe GmbH
Company Description
Nanoscribe’s 3D laser lithography systems "Photonic Professional" are designed for the fabrication of true three-dimensional micro- and nanostructures in various commercially available photoresists. This unique performance is based on multiphoton-absorption: Ultra-short laser pulses expose pre-defined 3D micro- and nanostructures, which finally after development result as self-supporting structures anchored to a substrate. The herewith routinely achieved feature sizes are ranging down to 150 nm. Microscope objectives and the scanning stage will be especially configured for the particular field of application. This way, a structuring depth of up to 300 µm on an area of up to 100x100 mm˛ at most is realizable. A functional and intuitive user interface eases the realization of arbitrary CAD designs. Numerous photosensitive materials can be structured via 3D laser lithography, mostly polymers. Nanoscribe also offers in-depth knowledge at the casting of 3D structures into metals, semi-conductors and SiO2.
The unique ability to structure in 3D on a sub-micrometer scale in a controlled fashion is valuable for numerous areas of research like photonics, micro-optics, microfluidics, nano- and microtechnology or life sciences, e.g. rapid prototyping of three-dimensional extracellular matrices for cell growth studies.
Contact Information
 Hermann-von-Helmholtz-Platz 1
Eggenstein-Leopoldshafen
Germany
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