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SPIE Photomask Technology
20 - 21-September 2011
Monterey, California, USA

Synopsys, Inc.

Address
Synopsys, Inc.
700 E Middlefield Rd
Mountain View, CA
United States
Company Description
Featured Product: Proteus LRC for lithography verification

Synopsys is a world leader in EDA and IC manufacturing software and has the industry's most comprehensive solution from design to silicon. Synopsys’ approach ensures an intelligent use of technology and data throughout the flow. Speak with experts about how Synopsys’ production-proven mask synthesis, lithography simulation, and leading mask data preparation can provide superior turnaround time, cost of ownership, and accuracy of results at advanced technology nodes.
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Enter keywords to find conferences with open calls for papers and submit an abstract.

Important Dates

To better accommodate the needs of the Photomask community, late abstact submissions may be sent to Pat Wight at patw@spie.org . If accepted, they will be placed in the poster session.

Manuscripts Due
23 August 2012


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