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SPIE Photomask Technology
20 - 21-September 2011
Monterey, California, USA

RAVE LLC

Address
RAVE LLC
430 S Congress Ave Ste 7
Delray Beach, FL
United States
Company Description
Featured Product: Merlin® 22nm Nanomachining Mask Repair
fp650™ Femto-pulse Laser Mask Repair
Rhazer® Haze Removal

RAVE, technology-driven company with a long history of unique technical contributions to the Photomask Industry. RAVE’s exceptionally talented team is well recognized for development & on-time delivery of innovative, cost-saving process solutions. RAVE is now delivering the new 5th Generation Merlin® 22nm production mask repair nanomachine & revolutionary Rhazer® haze removal system. RAVE’s fp650™ femto-pulse laser tool continues to be the fastest, most efficient >45nm production mask repair.
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Enter keywords to find conferences with open calls for papers and submit an abstract.

Important Dates

To better accommodate the needs of the Photomask community, late abstact submissions may be sent to Pat Wight at patw@spie.org . If accepted, they will be placed in the poster session.

Manuscripts Due
23 August 2012


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