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Short Course

Design of Efficient Illumination Systems (SC011)

Course Level: Intermediate
Format Member Non-Member
InCompany
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SPIE Photonics West
San Francisco, California, United States
Sunday 29 January 2017
1:30 PM - 5:30 PM
CEU Credits: 0.4
NON-MEMBER
$430.00
MEMBER
$375.00

Course
Description


Illumination systems are included in fiber illuminators, projectors, and lithography systems. The design of an illumination system requires balancing uniformity, maximizing the collection efficiency from the source, and minimizing the size of the optical package. These choices are examined for systems using lightpipes, lens arrays, faceted optics, tailored edge rays designs, and integrating spheres through a combination of computer simulations, hardware demonstrations and discussions.
Illumination systems are included in fiber illuminators, projectors, and lithography systems. The design of an illumination system requires balancing uniformity, maximizing the collection efficiency from the source, and minimizing the size of the optical package. These choices are examined for systems using lightpipes, lens arrays, faceted optics, tailored edge rays designs, and integrating spheres through a combination of computer simulations, hardware demonstrations and discussions.

Learning
Outcomes


This course will enable you to:
  • describe the differences between illuminance, intensity and luminance
  • compute the required source luminance given typical illumination system specifications
  • compute the change in luminance introduced by an integrating sphere
  • distinguish between a Kohler illuminator and an Abbe illuminator
  • explain the difference in uniformity performance between a tailored edge ray reflector and a standard conic reflector
  • design a lightpipe system to provide uniform illuminance
  • design a lens array system to create a uniform illuminance distribution
  • design a reflector with facets to create a uniform illuminance distribution

Intended
Audience


Individuals who design illumination systems or need to interface with those designers will find this course appropriate. Previous exposure to Optical Fundamentals (Reflection, Refraction, Lenses, Reflectors) is expected.

About the
Instructor


Bill Cassarly is a Synopsys Scientist at Synopsys (formerly Optical Research Associates). Before joining ORA 19 years ago, Cassarly worked at GE for 13 years, holds 48 US patents, and has worked extensively in the areas of illumination system design, sources, photometry, light pipes, and non-imaging optics. Bill was awarded the GE Corporate 'D. R. Mack Advanced Course Supervisor Award' for his efforts in the training of GE Engineers and is an SPIE Fellow.

Additional
Notes


Attendee testimonial:
This was the most illumination info I've had in one place!
Attendee testimonial:
This was the most illumination info I've had in one place!
Format Member Non-Member
InCompany
Contact SPIE
Contact SPIE
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