Attend the most important worldwide technical event in the photomask industry

Now more than ever people are looking for the innovations and solutions that will differentiate their products and research from the rest. Innovation is critical to keeping ahead in difficult economic times and your research is a vital part of the innovation equation.

Submit your abstract to SPIE Photomask Technology

Presenting your research at The Annual SPIE/BACUS Symposium is your best opportunity for having your work seen by leaders in your field. This worldwide technical conference and exhibition is the premier event for photomask industry.

This year's four-day symposium will give you the chance to present your research on emerging and on-going issues facing the photomask industry in advanced lithography and their manufacturing and data solutions. The industry's progress in this new economic landscape will depend on the successful integration and optimization of design, maskmaking, and wafer fabrication.

Solve the most pressing issues in:

Mask Infrastructure

• Materials
• Patterning
• Resist Processing
• Etch
• Inspection
• Cleaning
• Repair
• Metrology

Mask Integration

• Double patterning
• Design for Manufacturing/Process Integration and yield optimization
• Source/mask optimization
• Simulation and Tolerancing for Hyper-NA Applications
• Substrates and Materials
• Extreme NA/Immersion Applications
• Reticle Enhancement and Optical Proximity Effects
• Mask Data Preparation and Mask Rules Development
• Advanced RET
• DFM Opportunities for Fabless Applications
  

Emerging Mask Technology

• Double patterning
• EUV Mask Materials
• EUV Mask Infrastructure
• Imprint
• Gray Scale Technology
  

Mask Business

• Mask Business and Management
• Direct Write/Maskless Technology 
   

We welcome your participation!

Sponsors