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The Moscone Center
San Francisco, California, United States
27 January - 1 February 2018
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Plan to Participate

Present your research at SPIE LASE, part of Photonics West 2018.

SPIE LASE has developed into the main forum and meeting place for not only laser science and laser scientists, but also for novel laser applications and laser process engineers. The main communities participating in LASE are technology innovators reporting their latest developments and research discoveries.

Participation from academia is stable, and we have seen increasing participation from benefiting industries like microelectronics, computers, machine tools, and classical industries including automotive and manufacturing. LASE increasingly addresses business closer to the end user, closing the gap from bottom up competency oriented novelties and new science to market driven visions of new societal benefits from the point of view of the end user.

Consequently, we seek scientific contributions, new research results, and presentations that include perspectives for applications or even direct applicability to existing and new industries. The more the authors accept and fulfill this request, the more successful LASE will become because the impact of new science on innovation and new markets will be visible and become directly feasible.

We reach out to scientists to showcase their latest additions in the ever-growing toolbox of laser capabilities and to the representatives of the industrial R&D sector to help communicate to fundamental scientists the demands of emerging industrial and social applications.

We look forward to innovating LASE by disseminating relevant research contributions for more effective impact on our everyday life in the societies around the world.


Symposium Chairs

Koji Sugioka, RIKEN (Japan) Koji Sugioka
RIKEN (Japan)
Symposium Chair  Reinhart Poprawe  Fraunhofer-Institut für Lasertechnik (Germany) Reinhart Poprawe
Fraunhofer-Institut für Lasertechnik (Germany)

Symposium Co-Chairs

Xianfan Xu  Purdue Univ. (USA) Xianfan Xu
Purdue Univ. (USA)
Beat Neuenschwander  Berner Fachhochschule Technik und Informatik (Switzerland) Beat Neuenschwander
Berner Fachhochschule Technik und Informatik (Switzerland)

Important Dates

Abstracts Due
17 July 2017

Author Notification
25 September 2017

LASE Manuscripts Due
3 January 2018


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