• Photomask Technology
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San Jose Convention Center
San Jose, CA, United States
12 - 14 September 2016
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Submit your abstract to present in San Jose

SPIE Photomask Technology 2016 in San Jose, California, USA

Present and publish at SPIE Photomask Technology 2016, the premier worldwide technical meeting for mask making, emerging mask technologies, and mask business.

Please note the 2016 event will take place in San Jose, California, USA.

Call for papers is open. Submit your abstract by 28 March.
  Submit online
  Download the PDF (4 MG PDF)

Conference topics for Photomask Technology

• Mask making
• EUV mask technologies
• Emerging mask technologies
• Computational lithography
• Mask application
• Mask business
Co-located with SPIE Scanning Microscopies 2016
SPIE Photomask Technology will be co-located with SPIE Scanning Microscopies 2016, a multidisciplinary conference for advancing scanning microscopy technologies and applications. Two conferences for one registration, plus access to multidisciplinary connections and information.
SPIE Scanning Microscopies
San Jose Marriott and San Jose Convention Center
San Jose, California, United States
12-14 September 2016

SPIE conference papers are published in the Proceedings of SPIE and available via the SPIE Digital Library, the world’s largest collection of optics and photonics research.  

The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers. 


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Important Dates

Abstract Due Date
28 March 2016

Author Notification
9 May 2016

Manuscripts Due
15 August 2016

Browse SPIE Proceedings from SPIE Photomask Technology

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