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San Jose Convention Center
San Jose, California, United States
12 - 14 September 2016
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Exhibit at SPIE Photomask Technology 2017

The SPIE Photomask Technology Exhibition, 29 - 30 September 2015

Exhibit at the 2017 Photomask Technology Exhibition, 12- 13 September 2017, the mask-making industry's premier event. Meet with more than 500 top researchers and engineers in the mask-making field.

Note the 2017 event will take place in Monterey, California, USA.

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Exhibition Dates: 12-13 September 2017

2017 Exhibitor Contract | Online or PDF 

Exhibition Flyer

Exhibitor List 

Exhibition Floor Plan

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Exhibitor Logistics

Join top companies showcasing these technologies:
 • Mask technologies: Inspection/repair, Metrology, Cleaning
 • Mask business
 • EUV
 • Nanoimprint
 • Direct write
 • Patterning
 • Wafers
 • Tools
 • Simulation
 • Resists and substrates
 • Materials and etching
Who will be there
 • Engineers and designers
 • Corporate managers
 • Application and product developers
 • Mask and chip designers
 • Resist chemists
 • Experts in mask infrastructure and mask integration
 • Standards developers

Contact the SPIE sales team

America, Asia and the majority of the World
Melissa Farlow
Tel: +1 360 685 5596
Fax: +1 360 647 1445

In Europe (except UK, Ireland, France)
Hermann Doster
Tel: +49 (0)7025/841 806
Fax: +49 (0)7025/842 983

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