• Photomask Technology
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San Jose Convention Center
San Jose, California, United States
12 - 14 September 2016
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Don't miss the Photomask Technology 2017 Exhibition

The SPIE Photomask Technology Exhibition, 13 - 14 September 2016

The SPIE Photomask Technology Exhibition, the mask-making industry's premier event. Join us as an exhibitor or walk the floor to meet key suppliers of mask components, software, and manufacturing equipment.

Please note the 2016 event will be held in San Jose, California, USA.

Monday 12 September 10:00 am to 4:00 pm
Tuesday 13 September 10:00 am to 4:00 pm

Registration pricing and details The exhibition is free, but you must register
2015 Final Program Download the 2016 Exhibition Guide (2 MB PDF)

Featured technologies at the premier mask-making event

 • Mask technologies: Inspection/repair, Metrology, Cleaning
 • Mask business
 • EUV
 • Nanoimprint
 • Direct write
 • Patterning
 • Wafers
 • Tools
 • Simulation
 • Resists and substrates
 • Materials and etching

These technologies help make computers, smartphones, flat screen TVs and solar panels more affordable and accessible to consumers and businesses around the world.

The SPIE Photomask Exhibition - where you learn about the research that can influence your next product.

"This conference is critical for getting the core people together to have discussions. The exchange of technology really helps us to innovate new technologies and that’s what we need with all these emerging markets."
— Petrie Yam, KLA-Tencor

Information for new and existing exhibitors
See the For Exhibitors page