• Photomask Technology + Extreme Ultraviolet Lithography
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Monterey Marriott
Monterey, California, United States
11 - 14 September 2017
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New in 2017, SPIE Photomask Technology and the International Conference on Extreme Ultraviolet Lithography are now co-located. 

Read the welcome from the chairs of:
SPIE Photomask Technology
International Conference on Extreme Ultraviolet Lithography

SPIE Photomask Technology

The 37th Photomask Symposium, organized by SPIE and BACUS, the International Photomask Group of SPIE, brings authors together to present the latest advances in technology and their impact on the semiconductor lithography industry.

This year, we will start the conference off with the Photomask Keynote Presentation being given by Prof. Tsu-Jae Ling Liu from Univ. of California, Berkeley. The Photomask and Extreme Ultraviolet Lithography conferences will come together for several joint session throughout the week. Don't miss the joint panel Wednesday afternoon on EUVL: Managing without actinic Patterned Mask Inspection.

As the Symposium Chairs, we welcome you once again to Monterey! It is sure to be another great meeting!

Peter D. Buck

Peter D. Buck
Mentor Graphics Corp.
2017 Photomask Symposium Chair


Emily E. Gallagher

Emily E. Gallagher
2017 Photomask Symposium Co-Chair


2017 BACUS Steering Committee

Frank Abboud, Intel Corp.
Michael D. Archuletta, RAVE LLC
Artur Balasinski, Cypress Semiconductor Corp.
Uwe F. W. Behringer, UBC Microelectronics
Peter D. Buck, Mentor Graphics Corp.
Brian Cha, Samsung Electronics Co., Ltd.
Jerry Cullins, Hoya Corp. USA
Derren Dunn, IBM Corp.
Brian J. Grenon, Grenon Consulting
Jon Haines, Micron Technology Inc.
Naoya Hayashi, Dai Nippon Printing Co., Ltd.
Bryan S. Kasprowicz, Photronics, Inc.
Patrick M. Martin, Applied Materials, Inc.
Shane Palmer, Nikon Research Corp. of America
Jan Hendrik Peters, Carl Zeiss SMT GmbH
Moshe Preil, KLA-Tencor Corp.
Douglas J. Resnick, Canon Nanotechnologies, Inc.
Thomas Struck, Infineon Technologies AG
Bala Thumma, Synopsys, Inc.
Michael Watt, Shin-Etsu MicroSi, Inc.
Jim N. Wiley, ASML US, Inc.
Larry S. Zurbrick, Keysight Technologies, Inc.

International Conference on Extreme Ultraviolet Lithography

The 2017 EUVL Conference, organized by SPIE, EUREKA, IMEC, and EIDEC, provides a forum to discuss and assess the worldwide status of EUVL technology and infrastructure readiness, as well as opportunities for future extension of the technology. We are excited to announce that for 2017, the EUVL Conference is collocated with Photomask Technologies, the seminal international forum to present photomask technology.

We will have our Keynote Presentation on Tuesday morning, given by Dr. Gregory R. McIntyre from IMEC, discussing EUV Readiness, Insertion Opportunities, and Challenges for Logic and Memory. There are several EUVL/Photomask joint session throughout the week.

We welcome you to EUVL, and to Monterey, California!

Paolo A. Gargini

Paolo A. Gargini
Stanford Univ. (United States)

Patrick P. Naulleau

Patrick P. Naulleau
Lawrence Berkeley National Lab. (United States)

Kurt G. Ronse

Kurt G. Ronse
IMEC (Belgium)

Toshiro Itani

Toshiro Itani
EUVL Infrastructure Development Ctr., Inc. (Japan)


Important Dates

Author Notification
19 June 2017

Manuscripts Due
14 August 2017

Registration increases
25 August 2017

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Browse Photomask 2010 papers