• Photomask Technology + Extreme Ultraviolet Lithography
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Monterey Conference Center and Monterey Marriott
Monterey, California, United States
17 - 20 September 2018
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Welcome

SPIE Photomask Technology and the Extreme Ultraviolet Lithography

This year we start the week off with John Y. Chen, NVIDIA (USA), and Timothy Brunner, GLOBALFOUNDRIES Inc. (USA) each giving a plenary presentation. The Photomask Technology and the Extreme Ultraviolet Lithography conferences will come together throughout the week with joint sessions. Don't miss the joint panel discussion on Wednesday on Optical and EUV Masks: Analyzing the HVM Requirements and Capability Differences.

As conference chairs, we hope you enjoy beautiful Monterey in the Fall!

SPIE Photomask Technology
International Conference on Extreme Ultraviolet Lithography


SPIE Photomask Technology  

The 38th Photomask Conference organized by SPIE in cooperation with BACUS Technical Group, is the global forum for scientists, engineers, and industry leaders to present and discuss key topics related to photomasks. The conference addresses design, fabrication, quality control, and the use of photomasks in the semiconductor industry.

Emily E. Gallagher

Emily E. Gallagher
imec  (Belgium)
2018 Photomask Technology Conference Chair

 

Jed H. Rankin

Jed H. Rankin
GLOBALFOUNDRIES Inc. (USA)
2018 Photomask Technology Conference Co-Chair

 



International Conference on Extreme Ultraviolet Lithography

The International Conference on Extreme Ultraviolet Lithography provides a forum to discuss and assess the worldwide status of EUV technology and infrastructure readiness. Scientists, engineers, and industry leaders meet to present and discuss new and unpublished materials.

Kurt G. Ronse

Kurt G. Ronse
imec (Belgium)
2018 EUV Lithography Conference Chair

Eric Hendrickx

Eric Hendrickx
imec (Belgium)
2018 EUV Lithography Conference Co-Chair

Patrick P. Naulleau

Patrick P. Naulleau
Lawrence Berkeley National Lab. (United States)
2018 EUV Lithography Conference Co-Chair

Paolo Gargini

Paolo A. Gargini
Stanford Univ. (United States)
2018 EUV Lithography Conference Co-Chair

Toshiro Itani

Toshiro Itani
EUVL Infrastructure Development Ctr., Inc. (Japan)
2018 EUV Lithography Conference Co-Chair


 

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Important Dates

Abstracts Due:
Late submissions will be considered by the conference chairs. Please contact SPIE Program Coordinator Pat Wight for instructions.

Author Notification: 25 June 2018

Manuscripts Due: 22 August 2018


Browse Defense, Security, and Sensing 2011 papers


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