• Photomask Technology + Extreme Ultraviolet Lithography
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Monterey Marriott
Monterey, California, United States
11 - 14 September 2017
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Author and Presenter Information

Follow these instructions to develop a successful abstract, presentation, and manuscript, for presentation at the conference and publication in the Proceedings of SPIE and the SPIE Digital Library

Follow these instructions to develop a successful presentation, and manuscript, for presentation at the conference and publication in the Proceedings of SPIE in the SPIE Digital Library.

Abstract Due Date: 24 April 2017
Official notifications have been sent to the contact authors.

1. Review the Technical Program

2. Prepare to Present at the Conference

Presentation Questions? Contact Pat Wight

Present a Better Paper. Take one of these online courses from SPIE:

These courses are free for SPIE Members.

3. Prepare and Submit Your Manuscript  

Manuscript Questions? the SPIE Proceedings Coordinator will be assigned in May 2017.

Important Dates

Author Notification
19 June 2017

Manuscripts Due
14 August 2017

Registration increases
25 August 2017


Present to Room-Publish to World


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