• Photomask Technology + Extreme Ultraviolet Lithography 2017
    For Exhibitors
Monterey Conference Center and Monterey Marriott
Monterey, California, United States
11 - 14 September 2017
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Featuring an updated name, the event heads back to Monterey in September of 2017

SPIE Photomask + Extreme Ultraviolet Lithography 2017

SPIE Photomask Technology + Extreme Ultraviolet Lithography 2017, the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.

Registration pricing and details View registration pricing and details
Review the 2016 Photomask Technology program
2016 Event News and Photos
Final Program (2 MB PDF)
Technical Abstracts (3 MB PDF)
Exhibition Guide (2 MB PDF)

2016 Keynote Presentation
Christopher Progler

Making Lithography Great

Christopher Progler
Chief Technology Officer and Vice President of Strategic Planning
Photronics, Inc. 

2015 Final Program Download the Advance Program (2 MB PDF)
View Hotel Information View Hotel Information
2016 Topics
Mask Making:
Mask data preparation • Substrates, materials, pellicles • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask making
Anamorphic Masks for High-NA EUV:
Lithograph, OPC, and SMO models • Magnification interactions • Impact of half-field reticles • Stitching for mask making/design
Emerging & Alternate Mask Technologies:
EUV mask making • EUV mask inspection and repair • EUV mask infrastructure • EUV mask application • Nanoimprint mask making • Nanoimprint mask application • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML²
EUV pellicles:
Nanoimprint mask making • Nanoimprint mask applications • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML² • Masks for flat panel displays • Masks for MEMs
Mask Business:
Mask manufacturing control • Reticle management in the fab and mask shop • Mask management in wafer fabs • Business aspects of masks • Infrastructure challenges
Review the 2015 Program
 • News and photos
 • Final Technical Program (5 MB PDF)
 • 2015 Exhibition Guide (3 MB PDF)
 • Technical Abstracts (1 MB PDF)

SPIE conference papers are published in the Proceedings of SPIE and available via the SPIE Digital Library, the world’s largest collection of optics and photonics research.  

The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers. 


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Important Dates

Abstract Due Date
24 April 2017

Author Notification
19 June 2017

Manuscripts Due
14 August 2017

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