Monterey Conference Center and Monterey Marriott
Monterey, California, United States
11 - 14 September 2017
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Photomask 2015 Awards

Awards Presented at Photomask 2016


BACUS Lifetime Achievement Award 2016
was presented to

Dr. Naoya Hayashi, Research Fellow, Dai Nippon Printing Co., Ltd. (Japan)
In recognition for outstanding contributions over several decades in the area of photomask technology. Dr. Hayashi has also provided leadership and guidance in developing cooperation between Photomask Japan, Photomask, and the Bay Area Chromium Users Society (BACUS). This cooperation has created the most successful avenue for communication of technical advancements in photomask technology.


Photomask/BACUS 2016

Best Paper Awards

1st Place Best Paper Award
World’s 1st high-throughput multi-beam mask writer
Christof Klein, Elmar Platzgummer, IMS Nanofabrication AG (Austria) [9985-4]

2nd Place Best Paper Award
The costs of masks: hiding or revealing the real solution
Michael J. Lercel, ASML Fishkill (United States); Bryan S. Kasprowicz,
Photronics, Inc. (United States) [9985-27]

3rd Place Best Paper Award
Identification of a new source or reticle contamination
Brian J. Grenon, David Brinkley, RAVE, LLC (United States) [9985-39]

Best Poster Awards

1st Place Best Poster
7nm e-beam resist sensitivity characterization
Amy E. Zweber, GLOBALFOUNDRIES Inc. (United States); Yusuke Toda, Toppan Photomasks, Inc. (United States); Yoshifumi Sakamoto, Toppan Printing Co., Ltd. (Japan); Thomas B. Faure, Jed H. Rankin, Steven C. Nash, GLOBALFOUNDRIES Inc. (United States); Masayuki Kagawa, Toppan Photomasks, Inc. (United States); Michael Fahrenkopf, GLOBALFOUNDRIES Inc. (United States); Takeshi Isogawa, Toppan Photomasks, Inc. (United States); Richard E. Wistrom, GLOBALFOUNDRIES Inc. (United States) [985-86]

2nd Place Best Poster
Mechanical stress induced by external forces in the extreme-ultraviolet pellicle
Hyun-Ju Lee, Hye-Keun Oh, Eun-
Sang Park, In-Seon Kim, Hanyang Univ. (Korea, Republic of) [9985-55]

3rd Place Best Poster
Investigation of fabrication process for sub-20nm dense pattern of non-chemically amplified electron-beam resist based on acrylic polymers

Shunsuke Ochiai, Tomohiro Takayama, Yukiko Kishimura, Hironori Asada, Yamaguchi Univ. (Japan); Manae Sonoda, Minako Iwakuma, National Institute of Technology, Miyakonojo College (Japan); Ryoichi Hoshino, Gluon Lab. LLC (Japan) {9985-56]


2nd Annual Photronics Best Student Paper Award

First Place Winner

Influence of non-uniform intensity distribution of locally deformed pellicle for N7 patterning
In-Seon Kim, Guk-Jin Kim, Hanyang Univ. (Korea, Republic of); Michael Yeung, Fastlitho Inc. (United States); Eytan Barouch, Boston Univ. (United States); Min-Su Kim, Jin-Goo Park, Hanyang Univ (Korea, Republic of); Hye-Keun Oh, Hanyang Univ. (Korea, Republic of) [9985-14]

 


Finalist Prizes were presented to

Dependence of dissolution behavior of main-chain scission type resists on molecular weight
Akihiro Konda, Hiroki Yamamoto, Takahiro Kozawa, Osaka Univ. (Japan); Shusuke Yoshitake, NuFlare Technology, Inc. (Japan) [9985-15]

Phase contrast pupil engineering for EUV actinic pattern inspection
Yow-Gwo Wang, Andy R. Neureuther, Univ. of California, Berkeley (United States), Lawrence Berkeley National Lab. (United States); Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States) [9985-16]

Feature size dependence of mask topography induced phase effects measured with an aerial imaging tool
Aamod Shanker, Univ. of California, Berkeley (United States); Martin Sczyrba, Falk Lange, Advanced Mask Technology Ctr. GmbH Co. KG (Germany); Brid Connolly, Toppan Photomasks, Inc. (Germany); Andy R. Neureuther, Laura Waller, Univ. of California, Berkeley (United States) [9985-17]

Awards Sponsored by

Photronics


Zeiss Award for Talents in the Photomask Industry

Phase contrast pupil engineering for EUV actinic pattern inspection
Yow-Gwo Wang, Andy R. Neureuther, Univ. of California, Berkeley (United States), Lawrence Berkeley National Lab. (United States); Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States) [9985-16]

Award Sponsored by

Zeiss

Important Dates

Abstract Due Date
24 April 2017

Author Notification
19 June 2017

Manuscripts Due
14 August 2017


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