• Photomask Technology + Extreme Ultraviolet Lithography 2017
    Plan to Participate
    For Authors and Presenters
    For Chairs and Committees
    For Exhibitors
Monterey Conference Center and Monterey Marriott
Monterey, California, United States
11 - 14 September 2017
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The 37th Photomask Symposium, organized by SPIE and BACUS, the International Photomask Group of SPIE, provides the format to present advances in technology and their impact on the semiconductor lithography industry.

As the Symposium Chairs, we urge you to participate by submitting your abstract(s), and to encourage your colleagues to do the same. Also encourage your company to continue their support for the Photomask Technology Symposium.

We are returning to Monterey in 2017, and we hope to see you there.

Peter D. Buck

Peter D. Buck
Mentor Graphics Corp.
2017 Photomask Symposium Chair


Emily E. Gallagher

Emily E. Gallagher
2017 Photomask Symposium Co-Chair


2017 BACUS Steering Committee

Frank Abboud, Intel Corp.
Michael D. Archuletta, RAVE LLC
Artur Balasinski, Cypress Semiconductor Corp.
Uwe F. W. Behringer, UBC Microelectronics
Peter D. Buck, Mentor Graphics Corp.
Brian Cha, Samsung Electronics Co., Ltd.
Jerry Cullins, Hoya Corp. USA
Derren Dunn, IBM Corp.
Brian J. Grenon, Grenon Consulting
Jon Haines, Micron Technology Inc.
Naoya Hayashi, Dai Nippon Printing Co., Ltd.
Bryan S. Kasprowicz, Photronics, Inc.
Patrick M. Martin, Applied Materials, Inc.
Shane Palmer, Nikon Research Corp. of America
Jan Hendrik Peters, Carl Zeiss SMT GmbH
Moshe Preil, KLA-Tencor Corp.
Douglas J. Resnick, Canon Nanotechnologies, Inc.
Thomas Struck, Infineon Technologies AG
Bala Thumma, Synopsys, Inc.
Michael Watt, Shin-Etsu MicroSi, Inc.
Jim N. Wiley, ASML US, Inc.
Larry S. Zurbrick, Keysight Technologies, Inc.


Important Dates

Abstract Due Date
24 April 2017

Author Notification
19 June 2017

Manuscripts Due
14 August 2017

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