The 37th Photomask Symposium, organized by SPIE and BACUS, the International Photomask Group of SPIE, provides the format to present advances in technology and their impact on the semiconductor lithography industry.
As the Symposium Chairs, we urge you to participate by submitting your abstract(s), and to encourage your colleagues to do the same. Also encourage your company to continue their support for the Photomask Technology Symposium.
We are returning to Monterey in 2017, and we hope to see you there.
Peter D. Buck
Mentor Graphics Corp.
2017 Photomask Symposium Chair
Emily E. Gallagher
2017 Photomask Symposium Co-Chair
2017 BACUS Steering Committee
Frank Abboud, Intel Corp.
Paul Ackmann, GLOBALFOUNDRIES Inc.
Michael D. Archuletta, RAVE LLC
Artur Balasinski, Cypress Semiconductor Corp.
Uwe F. W. Behringer, UBC Microelectronics
Peter D. Buck, Mentor Graphics Corp.
Brian Cha, Samsung Electronics Co., Ltd.
Jerry Cullins, Hoya Corp. USA
Derren Dunn, IBM Corp.
Thomas B. Faure, GLOBALFOUNDRIES Inc.
Brian J. Grenon, Grenon Consulting
Jon Haines, Micron Technology Inc.
Naoya Hayashi, Dai Nippon Printing Co., Ltd.
Bryan S. Kasprowicz, Photronics, Inc.
Patrick M. Martin, Applied Materials, Inc.
Shane Palmer, Nikon Research Corp. of America
Jan Hendrik Peters, Carl Zeiss SMT GmbH
Moshe Preil, KLA-Tencor Corp.
Douglas J. Resnick, Canon Nanotechnologies, Inc.
Thomas Struck, Infineon Technologies AG
Bala Thumma, Synopsys, Inc.
Michael Watt, Shin-Etsu MicroSi, Inc.
Jim N. Wiley, ASML US, Inc.
Larry S. Zurbrick, Keysight Technologies, Inc.