• Photomask Technology + Extreme Ultraviolet Lithography 2017
    Plan to Participate
    For Authors and Presenters
    For Chairs and Committees
    For Exhibitors
Monterey Conference Center and Monterey Marriott
Monterey, California, United States
11 - 14 September 2017
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Chairs & Committee Member Information

The responsibilities of being Conference Chair, Program Committee Member, and Session Chair are crucial to the success of SPIE events, and it is you, our incredible volunteers, who are the true engine of the Society. On behalf of the Board of Directors and the entire staff of SPIE, THANK YOU for volunteering your time and dedication - we truly could not do this without you.

If you have any questions or concerns at any point along the way, please don't hesitate to contact Pat Wight, your Conference Program Coordinator.

Conference Timeline and Due Dates

5 December 2016 Call for Papers due from conference chairs to Pat Wight, your Conference Program Coordinator
24 April 2017 Abstracts due from authors, submitted via spie.org
22 May 2017

Advance Program for Photomask ONLY due from conference chairs to Pat Wight

No Advance Program for EUVL

3 July 2017

EUVL Final Program changes due from conference chairs to Pat Wight

10 July 2017

Photomask Technology Final Program changes due from conference chairs to Pat Wight

17 July 2017

Student Grant Applications due from student authors to Pat Wight

14 August 2017 Manuscripts due, submitted via http://spie.org/myaccount
11-14 September 2017 Conference Dates in Monterey, California
2 October 2017 Manuscript Reviews completed by Conference Chairs

Information for Conference Chairs

Information for Program Committee Members

Information for Session Chairs

Important Dates

Abstract Due
Late submissions may be accepted until 15 May 2017

Author Notification
19 June 2017

Manuscripts Due
14 August 2017

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