• Photomask Technology
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San Jose Convention Center
San Jose, California, United States
12 - 14 September 2016
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Thank you for attending the 2016 event

SPIE Photomask Technology 2016 in San Jose, California, USA

Thank you for attending SPIE Photomask Technology 2016, the premier worldwide technical meeting for mask making, emerging mask technologies, and mask business.

Registration pricing and details View registration pricing and details
Download the 2016 materials
Final Program (2 MB PDF)
Technical Abstracts (3 MB PDF)
Exhibition Guide (2 MB PDF)

We look forward to seeing everyone in Monterey, California 11-14 September 2017.

2015 Final Program Download the Advance Program (2 MB PDF)
View Hotel Information View Hotel Information
2016 Topics
Mask Making:
Mask data preparation • Substrates, materials, pellicles • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask making
Anamorphic Masks for High-NA EUV:
Lithograph, OPC, and SMO models • Magnification interactions • Impact of half-field reticles • Stitching for mask making/design
Emerging & Alternate Mask Technologies:
EUV mask making • EUV mask inspection and repair • EUV mask infrastructure • EUV mask application • Nanoimprint mask making • Nanoimprint mask application • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML²
EUV pellicles:
Nanoimprint mask making • Nanoimprint mask applications • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML² • Masks for flat panel displays • Masks for MEMs
Mask Business:
Mask manufacturing control • Reticle management in the fab and mask shop • Mask management in wafer fabs • Business aspects of masks • Infrastructure challenges
2016 Keynote Presentation
Christopher Progler

Making Lithography Great

Christopher Progler
Chief Technology Officer and Vice President of Strategic Planning
Photronics, Inc. 

Review the 2015 Program
 • News and photos
 • Final Technical Program (5 MB PDF)
 • 2015 Exhibition Guide (3 MB PDF)
 • Technical Abstracts (1 MB PDF)

SPIE conference papers are published in the Proceedings of SPIE and available via the SPIE Digital Library, the world’s largest collection of optics and photonics research.  

The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers. 


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Important Dates

Abstract Due Date
18 April 2016

Author Notification
27 May 2016

Manuscripts Due
15 August 2016

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