SPIE's Advanced Lithography Symposium offers a forum for practitioners of micro- and nano-lithography to hear the latest about state-of-the-art applications and techniques relevant to their work. The numerous short courses offered are taught by people active in the field, recognized for both theoretical knowledge and practical experience. 

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Announcements from Advanced Lithography 2007

The Diana Nyyssonen Memorial Award for Metrology Best Paper of 2006 for the conference Metrology, Inspection, and Process Control for Microlithography

Awarded toMasafumi Asano, Takahiro Ikeda, Toru Koike, and Hideaki Abe, Toshiba Corp. ( Japan)

For paper-In-line CD metrology with combined use of scatterometry and CD-SEM [6152-69]

Presented byChas Archie, 2007 Conference Chair

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The 2007 Best Student Paper Award for the Optical Microlithography

Awarded toNeal V. Lafferty, Rochester Institute of Technology

For paper-Mask enhancement using an evanescent wave effect, Coauthors-Jianming Zhou, Anatoly Bourov, Bruce W. Smith, Rochester Institute of Technology

Presented byDonis G. Flagello, 2007 Conference Chair

This award was made possible by the generous sponsorship from

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The 2006 C. Grant Willson Best Paper Award for the Advances in Resist Materials and Processing Technology conference

Awarded toGregory M. Wallraff, Carl E. Larson, Greg Breyta, Linda Sundberg, D. Miller, IBM Almaden Research Ctr.; Dario Gil, Karen Petrillo, IBM Albany Nanotech; W. Pierson, ASML Netherlands B.V. (Netherlands)

For paper-The effect of photoresist/topcoat properties on defect formation in immersion lithography [6163-39]

Presented by Qinghuang Lin, IBM Thomas J. Watson Research Ctr. and Clifford L. Henderson, Georgia Institute of Technology
2007 Conference Chairs

This award was made possible by the generous sponsorship from