Portola Plaza Hotel
    Monterey, California, United States
    4 - 7 May 2009
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    Past Event Overview

    SPIE would like to express its deepest appreciation to the symposium chairs, conference chairs, program committees, and session chairs who have so generously given of their time and advice to make this symposium possible.

    View Final Progam (pdf)

    View "Sessions at a Glance" Program (49 kb pdf)

    2009 presentations topics:
     •Helium Ion Microscopy
     •Atomic Force and Scanned Probe Microscopies
     •Microscopy and Analysis of Biological Materials
     •Sample Preparation Technology
     •Microscopy and Analysis of Food Microstructures
     •Microscopy Applications in Environmental Safety and Health
     •Focused Ion Beam Microscopy
     •Microspectroscopic Characterization with Multiple Probes
     •Optical Characterization of Biological Materials
     •Scanning Electron Microscopies
     •Applications of Scanning Microscopy to Forensics Science
     •Electron Beam Interaction Modeling Workshop
     •Discussion of NIST DTSA-II for Spectral Modeling
     •Plus a Forensics Forum
     •Scanning Microscopy in Forensic Science
     •Software for Scanning Microscopy
     •Basics and Industrial Applications of AFM

    Plenary Session - Tuesday 5 May


    New prospects for electron beams as tools for semiconductor lithography
    Tuesday 5 May
    8:40 to 9:20 am

    Hans C. Pfeiffer, Retired IBM. Currently a consultant in the area of electron optics for lithography, inspection and test (USA)


    XHR SEM: Enabling extreme high resolution scanning electron microscopy
    Tuesday 5 May
    9:20 to 10:00 am

    Richard Young, NanoElectronics Market Division at FEI (USA)


    Critical points of materials are a universal property characterizing every element and their compounds
    Tuesday 5 May
    10:00 to 10:40 am

    A.J. Tousimis, Tousimis Research Corporation, Inc. (USA)

    Technical Event on Thursday:
     •Forensics Forum