SPIE Photomask Technology 2014 | Annual BACUS Symposium

SPIE Photomask Technology 2015

SPIE Photomask Technology 2015, the premier worldwide technical meeting for mask making, emerging mask technologies, and mask business.

Review the 2015 Program
•	News and photos
•	Final Technical Program (5 MB PDF)
•	2015 Exhibition Guide (3 MB PDF)
•	Technical Abstracts (1 MB PDF)

2015 Keynote Presentation

Lithography and Mask Challenges at the Leading Edge

Harry J. Levinson
Sr. Director Technology Research
GLOBALFOUNDRIES

2015 Topics
Mask Making: Mask data preparation • Substrates and materials • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask making
Anamorphic Masks for High-NA EUV: Lithograph, OPC, and SMO models • Magnification interactions • Impact of half-field reticles • Stitching for mask making/design
Emerging Mask Technologies: EUV mask making • EUV mask inspection and repair • EUV mask infrastructure • EUV mask application • Nanoimprint mask making • Nanoimprint mask application • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML²
Mask Business: Mask manufacturing control • Mask shop management • Mask management in wafer fabs • Business aspects of masks • Infrastructure challenges

Co-located with SPIE Scanning Microscopies 2015
SPIE Photomask Technology is co-located with SPIE Scanning Microscopies 2015, a multidisciplinary conference for advancing scanning microscopy technologies and applications. Two conferences for one registration, plus access to multidisciplinary connections and information.
SPIE Scanning Microscopies Monterey Conference Center and Monterey Marriott Monterey, California, United States 29 September - 1 October 2015

Past Event Overview