Monterey Conference Center and Monterey Marriott
    Monterey, California, United States
    13 - 16 September 2010
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    Past Event Overview

    SPIE Photomask Technology concluded on 16 September 2010 
    The event presented the latest updates from leaders in the field. This worldwide technical conference and exhibition is the premier event for the photomask industry.

    View the current Photomask Technology website

    SPIE Photomask features: 

    • 140 papers in mask infrastructure, mask integration, emerging mask technology, and patterned media 
    • Networking opportunities with industry leaders at many special events
    • The latest product breakthroughs at the Exhibition 

    Sponsors

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