Monterey Marriott and Monterey Conference Center Monterey,
United States 14 - 17 September 2009
Past Event Overview
SPIE Photomask Technology is the premier worldwide technical conference and exhibition for the photomask industry. The 2009 symposium focused on the latest research on the emerging and on-going issues facing the photomask industry in advanced lithography and their manufacturing and data solutions. With the deep sub-wavelength era upon us, the industry's progress will depend on the successful integration and optimization of design, maskmaking, and wafer fabrication.