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    Past Event Overview

    Photomask Japan is the most important symposium on photomasks and NGL masks in Asia. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion. Display opportunities will be provided to mask manufacturing materials, and equipment companies.

    • 865 Attendees
    • 125 Papers

    Call for Papers PDF
    Advance Program PDF

    • Fabrication Process Steps and Equipment for Photomasks (process and equipment for developing, etching, cleaning, etc.)
    • Photomask Writing Tools and Technologies Metrology
    • Tools and Technologies
    • Inspection Tools and Technologies
    • Repairing Tools and Technologies
    • Mask Data Preparations EDA for Photomask
    • Photomasks with RET: PSM, Masks with OPC
    • Photomask relating Lithography Technologies
    • NGL Masks: EUV, E-Beam, Imprint, etc.
    •  Mask Cost and Mask Development Strategy
    • Materials of and for Photomasks