Thank you to all of those who attended SPIE Advanced Lithography, the premier conference for the lithography community. For 40 years, SPIE has brought together industry leaders to solve the latest challenges in lithography and patterning in the semiconductor industry.
Evolution in the Concentration of Activities in Lithography Harry J. Levinson Senior Director, GLOBALFOUNDRIES Inc
Minimizing Process-Induced Variability in Multiple Patterning Richard A. Gottscho Executive Vice President of Global Products, Lam Research Corp.
EUV Lithography: From the Very Beginning to the Eve of Manufacturing Anthony Yen Director, Nanopatterning Technology Infrastructure Division, Taiwan Semiconductor Manufacturing Co. Ltd.
Plenaries sponsored by:
2016 Conference Topic Areas
• Extreme Ultraviolet (EUV) Lithography
• Alternative Lithographic Technologies
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Patterning Materials and Processes
• Optical Microlithography
• Design-Process-Technology Co-optimization for Manufacturability
• Advanced Etch Technology for Nanopatterning
The Advanced Lithography Exhibition
Come meet the industry's top semiconductor suppliers, integrators, and manufacturers. For more than 40 years SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications and the exhibition is where you can see the latest products and meet with the leaders in the field.
SPIE conference papers are published in the Proceedings of SPIE and available via the SPIE Digital Library, the world’s largest collection of optics and photonics research.
The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers.
