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    Past Event Overview

    Exhibition Only online registration, it's free, is still open

    SPIE Advanced Lithography, 23 - 27 February 2014, the premier conference for the lithography community. For 38 years, SPIE has brought together this community to address challenges presented in fabricating next-generation integrated circuits.

    See what happened: onsite news and photos


    Technical Program (PDF 6 MB)

    Technical Abstracts (PDF 2 MB)

    Exhibition Guide (PDF 4 MB)

    2014 Plenary Speakers
     William H. Arnold, ASML

    My Year as SPIE President: What Does the Society Do and Who Makes It Happen?

    William H. Arnold
    Chief Scientist and VP of Technology Development Center, ASML
    2013 SPIE President

     Joseph Sawicki, Mentor Graphics

    Making the Impossible: Dealing with Patterns Throughout the Design and Manufacturing Flow

    Joseph Sawicki
    VP and GM, Design-to-Silicon Division,
    Mentor Graphics Corp.

     Akihisa Sekiguchi, Tokyo Electron Ltd.

    Beyond Scaling: Opportunities and Approaches

    Akihisa Sekiguchi
    Corporate VP and Deputy General Manager,
    Tokyo Electron Ltd.

    Plenaries sponsored by: