San Jose Convention Center and San Jose Marriott
    San Jose, California, United States
    24 - 28 February 2013
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    Past Event Overview

    Learn more about SPIE Advanced Lithography 2013:

    Read Onsite News

    2013 Technical Program (PDF 4.35 MB)

    2013 Technical Abstracts (PDF 2.14 MB)

    2013 Exhibition Guide (PDF 3.7 MB)

    Presentations in seven conferences:
     • Advanced Etch Technology for Nanopatterning
     • Extreme Ultraviolet (EUV) Lithography
     • Alternative Lithographic Technologies
     • Metrology, Inspection, and Process Control for Microlithography
     • Advances in Resist Materials and Processing Technology
     • Optical Microlithography
     • Design for Manufacturability through Design-Process Integration

    Contact Printing to EUV: Lessons Learned from the Art of Lithography

    Bill Siegle
    Independent Consultant and ASML Advisory Board Member


    The Evolution of EDA Alongside Rapid Silicon Technology Innovation

    Howard Ko
    Senior VP and General Manager, Synopsys Silicon Engineering Group


    The New U.S. Patent Law: What You Need to Know and How it Will Affect your Strategy

    Charles R. Szmanda
    The Patent Practice of Szmanda & Shelnut, LLC

    Plenaries sponsored by:
    Special Events
     • Poster receptions
     • Panel discussion - "Alternative Lithographic Technologies"
     • Panel discussion - "Making a Business Case for Disruptive Metrology Technologies: What Should We Invest In"
    The Advanced Lithography Exhibition
    Come meet the industry's top semiconductor suppliers, integrators, and manufacturers. For 35 years SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications and the exhibition is where you can see the latest products and meet with the leaders in the field.