San Jose Convention Center and San Jose Marriott
    San Jose, California, United States
    12 - 16 February 2012
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    Past Event Overview

    Register today | SPIE Advanced Lithography.


    Thanks for attending SPIE Advanced Lithography 2012, the world's premier semiconductor lithography conference and exhibition.
    The 2012 event ended Thursday 16 February, after a five-day run in beautiful San Jose, California.
    Read news, and check out photos, from this event

    THE 2012 PROGRAM
    View Final Program (PDF)
    View Technical Abstracts (PDF)
    View Exhibition Guide (PDF)
    More than 600 presentations highlighted the latest research 
     Advanced Etch Technology for Nanopatterning
    Extreme Ultraviolet (EUV) Lithography
    Alternative Lithographic Technologies
    Metrology, Inspection, and Process Control for Microlithography
    Advances in Resist Materials and Processing Technology
    Optical Microlithography
    Design for Manufacturability through Design-Process Integration

    2012 PLENARY SPEAKERS
     

    Jim Clifford

    Vice President and GM, CDMA Technologies (USA)

    The Mobile Wireless Phenomenon: A Continued Need for Advanced Lithography

     

    C. Grant Willson

    Professor of Chemical Engineering, University of Texas at Austin (USA)

    High-Resolution Patterning: A View of the Future

     

    Christopher J. Progler

    Chief Technology Officer, Photronics Inc. (USA)

    Squares Do Not Make Good Frisbees


    Plenaries sponsored by: